tailieunhanh - Lắng đọng lớp phủ CrN trên nền thép SKD61 bằng phương pháp phún xạ xung một chiều magnetron

Bài viết bàn về lớp phủ CrN được lắng đọng trên nền thép SKD61 bằng phương pháp phún xạ xung một chiều magnetron trên thiết bị chân không B30 VTD; sử dụng nguồn xung DC giữ ổn định ở 320W; đế thép SKD61 được thiên áp ở 150V. | 058-062 1 2 1 3 1 4 1 2 q 3 K 4 C6 - -6- -02-2017 B trên thi B30 VTD 320 W thiên áp -150 V. 2 trong m. 2 là 6 sccm và nén - 4 11 GPa . Abstract This paper discussed about the CrN layer coating on SKD61 substrate with pulse DC magnetron sputtering by B30-VTD equipment. The vacuum system has power pulses kept at capacity of 320 W and bias voltage - 150 V on the substrate. The N2 gas flow is controled in range 4 8 sccm and pulse frequency varied in range 150 50 kHz. The experiment results demonstracted the deposition rate of CrN layer was affected by N2 gas flow and pulse frequency. The coating thickness decreased with increasing gas flow and pulse frequency from down to m. The X-ray diffraction XRD of CrN coating was shown that the layer has good stabilization with crystalline structure in N 2 gas flow 6 sccm the main crystal orientation 200 the maximum residual compressive stress under the surface 200 was - GPa in case of frequency pulse 150 kHz. Keywords Pulsed DC sputtering CrN coating Pressure molding Residual stress. 0 0 058-062 2. -1 0 -1 2. -2 f 0 058-062 f 2 0 2 2 2 2 2 3. 2 2 2 x 1 1 2 2 x 2 x CrN CrN CrN CrN CrN Cr CrN CrN Cr2N 2 2 2 2 058-062 2 2 2 2 2 Ar N2 0 2 2 2 2 2 2 2 2 1 Failure Analysis 20 2012 43-53. 2 between molten aluminum and selected die castings 2 http webclient Delivery Manager digitool_items csm01_storage 2013 09 03 fi le_1 212644. 2 3 . Avelar-Batista thickness and deposition methods on the stripping rate of Cr- Technology 200 2005 1842-1848. 4 O. Salas K. Kearns S. Carrera . Moore 058-062 12 172 2003 117-127. and Residual Str Materials 4 2011 929-940. 5 Eduardo K. Tentardini Augusto O. Kunrath Cesar Aguzzoli Maria Castro John J. Moore Israel . 13 2007 . Coatings Technology 202 2008 3764-3771. 14 J. Lin . Wu . Zhang CrNx coatings Synthesized by dc and pulsed dc 6 J. Lin S. Carrera . Kunrath D. Zhong S. Myers Thin Solid Films 517 2009 1887-1894. for optimized die coatings The .