tailieunhanh - Si nanowires grown by Al-catalyzed plasma-enhanced chemical vapor deposition (PECVD) on quartz substrates for solar cell applications

In this work, we have use a plasma-enhanced chemical vapor deposition process (PECVD) to grow the SiNWs from Al thin films directly deposited on quartz substrates, the Al-catalyzed SiNWs thus obtained have been characterized by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and electrical measurements, including field- effect transistor evaluations. |