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Lecture ECE 6450 Microelectronic - Chapter 6: Rapid thermal processing
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Lecture ECE 6450 Microelectronic - Chapter 6: Rapid thermal processing. After studying this section will help you understand Minimize redistribution of dopants, minimal sqrt(Dt) with maximal D (high Temperature) allows repair of damage from ion implantation. Cold walls allow multiple processes to occur without cross contamination. Photochemistry can be exploited. |