tailieunhanh - Interfacial Compatibility in Microelectronics : Moving Away from the Trial and Error Approach

We are a group of dedicated material scientists each with 15–25 years of research and development experience in the assembly and interconnect technologies of electronics. Our experience in chemical and mechanical interfacial compatibility between dissimilar materials dates back to the end of the 1980s. Since the early 1990s with the rise of the electronics industry in Finland, we focused our work increasingly into the challenges of materials, assembly technologies and reliability of portable electronics. During the last decade, our research has expanded towards high performance electronics and microsystems in different applications including automotive and biomedical devices. We have cooperated with numerous electronics companies, including elec tronics OEMs and their suppliers,. | Microsystems Tomi Laurila Vesa Vuorinen ToniT. Manila Markus Turunen Mervi Paulasto-Krõckel Jorma K. Kivilahti Interfacial Compatibility ỉn Microelectronics Moving Away from the Trial and Error Approach 0 Springer Microsystems For further volumes http series .

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