tailieunhanh - Báo cáo hóa học: " Hf-based high-k materials for Si nanocrystal floating gate memories"

Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: Hf-based high-k materials for Si nanocrystal floating gate memories | Khomenkova et al. Nanoscale Research Letters 2011 6 172 http content 6 1 172 o Nanoscale Research Letters a SpringerOpen Journal NANO EXPRESS Open Access Hf-based high-k materials for Si nanocrystal floating gate memories Larysa Khomenkova1 Bhabani S Sahu2 Abdelilah Slaoui2 Fabrice Gourbilleau1 Abstract Pure and Si-rich HfO2 layers fabricated by radio frequency sputtering were utilized as alternative tunnel oxide layers for high-k Si-nanocrystals-SiO2 SiO2 memory structures. The effect of Si incorporation on the properties of Hf-based tunnel layer was investigated. The Si-rich SiO2 active layers were used as charge storage layers and their properties were studied versus deposition conditions and annealing treatment. The capacitance-voltage measurements were performed to study the charge trapping characteristics of these structures. It was shown that with specific deposition conditions and annealing treatment a large memory window of about V is achievable at a sweeping voltage of 6 V indicating the utility of these stack structures for low-operating-voltage nonvolatile memory devices. Introduction In recent years nanocrystal-based memory devices have attracted considerable attention as a possible solution to overcome the scaling issue of electronic nonvolatile memories NVMs http . By using discrete nanocrystals instead of the conventional continuous floating gate as charge storage nodes local-defect-related leakage can be reduced efficiently to improve data retention 1 . In this regard discrete-trap type semiconductor storage materials such as Si and Ge nanocrystals Si- and Ge-ncs embedded in a dielectric matrix have been demonstrated as potential candidates for the fabrication of high-speed high-density low-power-consuming and nonvolatile memories 2-6 . Several approaches have been reported for nanocrystal formation in a dielectric matrix such as chemical vapor deposition molecular beam epitaxy or sputtering. The main .

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