tailieunhanh - Báo cáo hóa học: "ZnSe nanotrenches: formation mechanism and its role as a 1D template"

Tuyển tập báo cáo các nghiên cứu khoa học quốc tế ngành hóa học dành cho các bạn yêu hóa học tham khảo đề tài: ZnSe nanotrenches: formation mechanism and its role as a 1D template | Wang et al. Nanoscale Research Letters 2011 6 272 http content 6 1 272 o Nanoscale Research Letters a SpringerOpen Journal NANO EXPRESS Open Access ZnSe nanotrenches formation mechanism and its role as a 1D template Gan Wang1 Shu Kin Lok2 and lam Keong Sou1 2 Abstract High-resolution transmission electron microscopy was used to characterize the microstructures of ZnSe nanotrenches induced by mobile Au-alloy droplets. The contact side interfaces between the AuZns alloy droplets and the ZnSe as well as the four side walls of the resulting 011 -oriented nanotrenches were found all belong to the 111 plane family with the front and back walls being the 111 A planes while the other two side walls being the 111 B planes. These findings offer a deeper understanding on the formation mechanism of the nanotrenches. Pure Au nanodashes were formed upon further deposition of Au on the nanotrenches. PACS Structure of nanocrystals and nanoparticles. Micro and nanoscale pattern formation. . Og High resolution transmission electron microscopy. Introduction As length scales decrease below the range easily accessible by lithographic patterning there is great interest in developing processes to form surface structures spontaneously 1 . Among the different approaches used for fabricating nanostructures deposition of functionalized materials into patterned nanotrenches on a substrate has attracted increasing interest. This approach has been applied to various applications such as chemical sensing dimensional crossover influence in granular electronic systems heterojunction tunneling field effect transistors and precise quantum dot placement 2-6 . Fabrication of nanotrenches structures can be achieved by a number of different ways such as electron-beam lithography 7 focused ion beam 2 8 milling and nanoimprint lithography 5 9 . These three approaches enjoy the advantage of b eing able to create highly ordered patterns however they suffer .