tailieunhanh - Micromechanical Photonics - H. Ukita Part 12

Tham khảo tài liệu 'micromechanical photonics - h. ukita part 12', kỹ thuật - công nghệ, cơ khí - chế tạo máy phục vụ nhu cầu học tập, nghiên cứu và làm việc hiệu quả | Future Applications 211 a AgOx Protective b Recording GeSbTe Pw mW Pw mW Pw greater than mW Fig. . Proposed working mechanism of super-RENS using AgOx mask layer Pr 6 mW in the spectrum in the upper right figure and the signal amplitude decreases due to the degradation of the resolution Ag cluster size increases . Scattered type super-RENS working mechanism On the basis of these results we propose a model for an Ag-super-RENS mechanism. Figure shows the states just after writing Pr 1mW for both the mask layer and the recording layer with write power Pw as a parameter. The working mechanism for the -ỉlò S is as follows. Bohh hhe mask and the recording aayer have five possibee depending nil I lie wrUe owwer Pw a as-depo b Ag pml ides umfermly dispested and eryslaliited afterr initialization Pw c Ag l rsseCT mid IpsiIí amrrphous Pw 45mW d Ag difOsrion and comptetely amorphous Pw and e Agringand bubble pit greater than Pw 8 mW . The mask layer for the super-RENS readout Pr 4mW has an Ag lũng srimciuro mid die rp sOnro is filled with O2 which increases both the CNR and the resolution limit. Optical pulse duty dependence To realize a short mark length we illuminated thermally isolated optical pulses having deci eased duty fe . Flume tfwws die rplafianthip bewwenn reflectivity V1 non-mark V2 mark and mark length for the write power of Pw with the super-RENS readout Pr 4mW the optical pulse duty ratio as a parameter. The signal amplitude Vpp V1 V2 increases as the duty ratio decreases which means the amorphous level difference between mark and nonmark increases because the difference in temperature increases due to the longer time separation between the laser pulses. Figure shows the relationship between CNR and mark length for the super-RENS readout optical pulse duty ratio as a parameter Pw mW . The reproduced signal 212 5 Near Field Mark length nm Fig. . Relationships between .